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AI 投资研究
从市场噪音到有出处的证据
L3上游

半导体设备

Lithography, etch, deposition, inspection, and advanced packaging tools.

需求为什么传导到这里

晶圆需求最终转化为设备需求:光刻、刻蚀、沉积、检测,以及把 HBM 堆叠与逻辑芯片键合的先进封装环节。设备离 AI 的新闻标题隔了两步,却比产能早一步。

瓶颈在哪

某些工序全球实际上只有一家供应商。而限制加速器出货量的,多次是先进封装产能,而不是晶圆投片量。

这是关于供应商集中度与交期的结构性观察,不是对任何标的的看法。

本层级的公司

  • TER受益

    Automated test equipment for semiconductors, including AI accelerator test.

  • AMAT受益

    Deposition, etch, and process equipment across logic, memory, and packaging.

  • LRCX受益

    Etch and deposition equipment, heavily used in memory and advanced packaging.

  • KLAC受益

    Process control, inspection, and metrology systems.

  • ASML受益

    Lithography systems, including the EUV tools used at leading-edge nodes.

  • ONTO受益

    Inspection and metrology, including advanced packaging process control.

  • ACMR受益

    Wafer cleaning and surface preparation equipment.

引用这些标的的公开 13F 申报

供研究参考,不构成任何推荐。以下是已向 SEC 存档的事实;把某个标的归入本层级是我们的分类,申报人并未作出这样的表述。

  • ARK Investment Managementreported a position inTER
    Form 13F-HR for the period ending 2026-06-30, filed 2026-08-14 · SEC filing
  • Bridgewater Associatesreported a position inTER
    Form 13F-HR for the period ending 2026-06-30, filed 2026-08-14 · SEC filing

下列条目来自 SEC 公开的 Form 13F-HR 申报,由申报主体就所示期间申报、并在其后提交 —— 它们不是当前持仓。Form 13F 仅覆盖美股多头头寸:不含空头、现金、非美资产和大多数衍生品,且申报的头寸可能已被卖出。把某个标的归入某一层级是 XingAI 的分类,不是申报人的。此处没有任何推荐,机构申报持有某标的也不构成你持有它的理由。

同一赛道

Descriptive positioning only. `stance` says whether a company's business is exposed to a layer, never whether to buy it. Layers with no exposure are not recommendations to add any.

每周简报:AI 产业链地图的图层变动,以及新的公开 13F 申报,均附出处。不含评分、不含分级、不含买卖信号,随时可退订。